Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Hard Mask Fabrication (HMF) - NanoSearcher
PDF) Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology
Etching with a hard mask - Plasma Etching - Texas Powerful Smart
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Innovatively composite hard mask to feature sub-30 nm gate patterning - ScienceDirect
Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect
Materials | Free Full-Text | A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm
Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
Spin on Hard-Mask Material - diagram, schematic, and image 08
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Microwaves101 | Photolithography 101
Simplified process flow illustrating (a) "via-first" and (b)... | Download Scientific Diagram
Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation
NIL_vs_NEP-768x604.png
In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays - Nanoscale (RSC Publishing)
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
